Integrated Circuits

Graver Technologies offers filtration solutions for the critical applications in the production of microelectronic devices.

Graver Technologies Integrated Circuit

Innovative Filtration Technology for the Semiconductor Industry

Filtration requirements are critical in the manufacture of very small electronic components referred to as integrated circuits. This broad category includes devices such as transistors, capacitors, resistors, diodes, LEDs, and photocells. The different types of devices can be integrated to form integrated circuits or VLSI (Very Large Scale Integration) devices such as microprocessors and random access memory (RAM). As more devices are stacked into a single integrated circuit, the distance between the devices, referred to as line width or geometry, is also reduced. This allows for more rapid functions while reducing the cost per chip. The processes used to make these devices, therefore, require ultrapure water as well as a number of potentially hazardous or aggressive chemicals and chemical mixtures, all of which must be highly filtered to ensure the quality of the devices and high yield.

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Graver Technologies Integrated Circuit

About Graver's Filters For Integrated Circuits

  • Fluoropolymer membrane and all-fluoropolymer construction to meet the chemical compatibility requirements for solvent-based strippers, Piranha, and aggressive acid-based products.
  • Manufactured, flushed with 18 MΩ-cm DI water, tested, and packaged in an ISO Class 7 Cleanroom Environment to ensure low extractable and low particle shedding
  • PES membrane for aqueous-based acids, offering superior flow characteristics, high contaminant capacity, and consistent removal of submicron particles.

Product Selection

  • ZTEC™ E - For critical particle control down to 0.03 micron for aqueous chemicals
  • TefTEC™ - Hydrophobic PTFE membrane for more aggressive chemical applications
  • Citadel® - All-fluoropolymer filter for the most critical and aggressive chemical applications

Final Applications

Metal Organic Chemical Vapor Deposition

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